JPH0437598B2 - - Google Patents
Info
- Publication number
- JPH0437598B2 JPH0437598B2 JP58053621A JP5362183A JPH0437598B2 JP H0437598 B2 JPH0437598 B2 JP H0437598B2 JP 58053621 A JP58053621 A JP 58053621A JP 5362183 A JP5362183 A JP 5362183A JP H0437598 B2 JPH0437598 B2 JP H0437598B2
- Authority
- JP
- Japan
- Prior art keywords
- layer
- optical waveguide
- forming
- semiconductor
- active
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Lifetime
Links
Classifications
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01S—DEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
- H01S5/00—Semiconductor lasers
- H01S5/40—Arrangement of two or more semiconductor lasers, not provided for in groups H01S5/02 - H01S5/30
- H01S5/4025—Array arrangements, e.g. constituted by discrete laser diodes or laser bar
- H01S5/4031—Edge-emitting structures
Landscapes
- Physics & Mathematics (AREA)
- Condensed Matter Physics & Semiconductors (AREA)
- General Physics & Mathematics (AREA)
- Electromagnetism (AREA)
- Optics & Photonics (AREA)
- Physical Deposition Of Substances That Are Components Of Semiconductor Devices (AREA)
- Semiconductor Lasers (AREA)
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP5362183A JPS59181587A (ja) | 1983-03-31 | 1983-03-31 | 半導体レーザ素子の製造方法 |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP5362183A JPS59181587A (ja) | 1983-03-31 | 1983-03-31 | 半導体レーザ素子の製造方法 |
Publications (2)
Publication Number | Publication Date |
---|---|
JPS59181587A JPS59181587A (ja) | 1984-10-16 |
JPH0437598B2 true JPH0437598B2 (en]) | 1992-06-19 |
Family
ID=12947973
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP5362183A Granted JPS59181587A (ja) | 1983-03-31 | 1983-03-31 | 半導体レーザ素子の製造方法 |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPS59181587A (en]) |
Families Citing this family (4)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPH0423378A (ja) * | 1990-05-14 | 1992-01-27 | Matsushita Electron Corp | 半導体レーザ装置 |
JPH07111357A (ja) * | 1993-10-05 | 1995-04-25 | Mitsubishi Electric Corp | 半導体レーザの製造方法 |
KR100705738B1 (ko) | 2005-09-16 | 2007-04-09 | 강봉섭 | 전해질이 분할된 리튬 전지 |
KR100874896B1 (ko) | 2007-01-04 | 2008-12-19 | 한국과학기술연구원 | 좁은 광퍼짐을 갖는 반도체 레이저 |
Family Cites Families (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS56164588A (en) * | 1980-05-23 | 1981-12-17 | Nippon Telegr & Teleph Corp <Ntt> | Semiconductor light amplifier |
JPS57152178A (en) * | 1981-03-17 | 1982-09-20 | Nippon Telegr & Teleph Corp <Ntt> | Semiconductor light emitting device with super lattice structure |
JPS57155790A (en) * | 1981-03-23 | 1982-09-25 | Hitachi Ltd | Optical transmission module |
-
1983
- 1983-03-31 JP JP5362183A patent/JPS59181587A/ja active Granted
Also Published As
Publication number | Publication date |
---|---|
JPS59181587A (ja) | 1984-10-16 |
Similar Documents
Publication | Publication Date | Title |
---|---|---|
US5604764A (en) | Semiconductor laser | |
US4870468A (en) | Semiconductor light-emitting device and method of manufacturing the same | |
US4380861A (en) | Method of making a semiconductor laser by liquid phase epitaxial growths | |
EP0209387B1 (en) | Semiconductor laser device | |
US6396863B1 (en) | High-power semiconductor laser device having index-guided structure with InAlGaP current confinement layer | |
JPS62257783A (ja) | 半導体レ−ザ素子 | |
US5309465A (en) | Ridge waveguide semiconductor laser with thin active region | |
JPH05259574A (ja) | 半導体レーザ装置及びその製造方法 | |
JPH0437598B2 (en]) | ||
US5304507A (en) | Process for manufacturing semiconductor laser having low oscillation threshold current | |
JP3108183B2 (ja) | 半導体レーザ素子とその製造方法 | |
US6600770B2 (en) | High-power semiconductor laser device having current confinement structure and index-guided structure and stably oscillating in single mode | |
JP2542570B2 (ja) | 光集積素子の製造方法 | |
JPH07312462A (ja) | 面発光レーザダイオードの製造方法,及び面発光レーザダイオード | |
JPH03185889A (ja) | 半導体レーザ素子およびその製造方法 | |
JP2973215B2 (ja) | 半導体レーザ装置 | |
JPH0629618A (ja) | マルチビーム半導体レーザ及びその製造方法 | |
JPH0682886B2 (ja) | 半導体レーザ装置の製造方法 | |
JPH0537078A (ja) | 量子井戸半導体レーザ素子およびその製造方法 | |
JP2699662B2 (ja) | 半導体レーザとその製造方法 | |
JPS6254987A (ja) | 半導体レ−ザ装置 | |
JP2812187B2 (ja) | 半導体レーザの製造方法 | |
JP2528834B2 (ja) | 半導体レ−ザ装置 | |
JPS60126880A (ja) | 半導体レ−ザ装置 | |
JP4024319B2 (ja) | 半導体発光装置 |